close up of water flowing out from a water treatment facility

Enzymatic contaminant control in wafer fabrication

Ultrapure water with less chemicals

Novonesis enzymes meet water purification standards in wafer production to reduce costs and carbon footprint.

Ultrapure water: A critical resource in semiconductor manufacturing

Ultrapure water is essential for wafer production, where even trace contamination can reduce wafer quality, wafer yield, and equipment integrity, increasing operating costs. Hydrogen peroxide (H₂O₂) effectively removes organic and metallic contaminants and protects surfaces during fabrication, but residual H₂O₂ must also be eliminated.

Enzymatic contaminant control of process water

Enzymatic decomposition is the simplest, safest, and most sustainable method for H₂O₂ removal. With the catalase enzyme, Hydrium™ 200, you can do a safe, simple and sustainable removal of residual H₂O₂ in wastewater from wafer fabrication, while cutting cost, freshwater intake and chemical footprint in your ultrapure water production at the same time.

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Benefits of using enzymes

Simple
Cut chemicals, cut costs and simplify your operations. Pure catalytic power without expensive CAPEX or logistical nightmares.
Safe
Fast and complete H₂O₂ removal with no contamination, asset, or occupational safety risks.
Sustainable
Reduce your freshwater intake and cut down on your carbon footprint too.